Home IDE Tech > Webinar > LSRRO for Energy-Efficient Semiconductor ZLD: Let the Membrane Do the Heavy Lifting

LSRRO for Energy-Efficient Semiconductor ZLD: Let the Membrane Do the Heavy Lifting

11 AM EDT | October 29, 2026

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MLD and ZLD are becoming table stakes as discharge limits tighten and water-reuse targets climb. The problem is the thermal last mile: evaporators and crystallizers carry most of the energy load and most of the cost. This session walks through a membrane-led process that pushes brine concentration much further before any thermal step, using IDE’s MaxH2O Desalter and a low-salt-rejection reverse osmosis (LSRRO), with a semiconductor brine case study behind it.

 

What you’ll learn:

  • Why conventional MLD/ZLD stays energy-intensive, and where the thermal step dominates the energy bill.
  • How LSRRO pushes concentration well beyond the conventional RO range by letting NaCl pass selectively and easing the osmotic-pressure penalty.
  • Why LSRRO rejection depends on brine composition, and how the process model accounts for that as the brine concentrates.
  • What a representative semiconductor brine reveals about energy, chemicals, CapEx, and OpEx when you compare the conventional train to the novel one.
  • How pre-concentration with MAXH2O Desalter enables safer, more reliable LSRRO operation.
Liron Ophek, Microelectronics Process Department Manager

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Why join

Your crystallizer is the biggest line on the energy bill. See how much of the flow can come off the thermal step entirely

Bulk chemical and solids-disposal costs keep climbing, and softening chemistry feeds both. See where a desalter-led train cuts them back

Discharge limits and POTW TDS caps are tightening faster than most fabs planned for. Understand what deeper membrane concentration makes possible for reuse and disposal

A grounded techno-economic assessment based on real process conditions and cost assumptions

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